Efficient CO Oxidation by Co/Ta2O5 Prepared by Deposition-Precipitation with Urea

被引:0
|
作者
Xia, Qing [1 ]
Qin, Haijian [1 ]
Xia, Feifei [1 ]
Yao, Pengfei [1 ]
Zheng, Chunzhi [1 ]
Zhao, Songjian [1 ]
Zhang, Huabing [2 ]
Yang, Fengli [1 ]
机构
[1] Jiangsu Univ Technol, Sch Resources & Environm Engn, Changzhou 213001, Jiangsu, Peoples R China
[2] Panzhihua Univ, Sch Biol & Chem Engn, Panzhihua 617000, Peoples R China
关键词
CO oxidation; Co/Ta2O5; Deposition-precipitation method with urea; CATALYSTS; PERFORMANCE; REACTIVITY; COBALT; TA2O5; CO3O4; OXIDE; TRANSITION;
D O I
10.1007/s10562-023-04551-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
CO oxidation at mild condition is significant for industrial process but still challenging nowadays, especially for the non-noble metal catalysts. The preparation method significant affect the catalytic activity of the catalyst. Comparing with cobalt supported on tantalum oxide prepared by impregnation method, Co/Ta2O5 prepared by deposition-precipitation method with urea in this study has smaller particle size, higher specific surface area and better redox properties, and these features make the catalyst exhibit higher catalytic activity for CO oxidation at mild condition. 90% CO conversion was achieved at 130 degree celsius, and CO was fully converted at 150 degree celsius. The XPS and DRIFTs results show that Co/Ta2O5 has more oxygen vacancies, and the absorbed CO will react with oxygen. The study may provide a new thought for the preparation of catalysts with high activity at mild condition.
引用
收藏
页码:3174 / 3183
页数:10
相关论文
共 50 条
  • [41] Deposition of Ta2O5 and (TiO2)-(Ta2O5) films from Ta(OEt)4(DMAE) and Ti(OEt)2(DMAE)2, by IMOCVD
    Jiménez, C.
    Paillous, M.
    Madar, R.
    Sénateur, J.P.
    Jones, A.C.
    Journal De Physique. IV : JP, 1999, 9 pt 2 (08): : 8 - 569
  • [42] Evaporation of Ta2O5
    Phys Lett Sect B Nucl Elem Part High Energy Phys, (16):
  • [43] Vaporization of Ta2O5
    Kazenas, E.K.
    Petrov, A.A.
    Samojlova, I.O.
    1600,
  • [44] Enhancement of the dielectric permittivity of Ta2O5 ceramics by CO2 laser irradiation
    Ji, LF
    Jiang, YJ
    Wang, W
    Yu, ZL
    APPLIED PHYSICS LETTERS, 2004, 85 (09) : 1577 - 1579
  • [45] Deposition of Ta2O5 and (TiO2)-(Ta2O5) films from Ta(OEt)4(DMAE) and Ti(OEt)2(DMAE)2, by IMOCVD
    Jiménez, C
    Paillous, M
    Madar, R
    Sénateur, JP
    Jones, AC
    JOURNAL DE PHYSIQUE IV, 1999, 9 (P8): : 569 - 573
  • [46] EVAPORATION OF TA2O5
    KAZENAS, EK
    PETROV, AA
    SAMOILOVA, IO
    RUSSIAN METALLURGY, 1994, (05): : 16 - 19
  • [47] The comparison between Ta2O5 and Ti-doped Ta2O5 dielectrics
    Kao, Chyuan Haur
    Lai, Pei Lun
    Wang, Hsin Yuan
    SURFACE & COATINGS TECHNOLOGY, 2013, 231 : 512 - 516
  • [48] Mechanical properties of Nb2O5 and Ta2O5 prepared by different procedures
    Shcherbina, O. B.
    Palatnikov, M. N.
    Efremov, V. V.
    INORGANIC MATERIALS, 2012, 48 (04) : 433 - 438
  • [49] Defect energy levels in Ta2O5 and nitrogen-doped Ta2O5
    Shin, Hyunho
    Park, Sang Yeup
    Bae, Shin-Tae
    Lee, Sangwook
    Hong, Kug Sun
    Jung, Hyun Suk
    JOURNAL OF APPLIED PHYSICS, 2008, 104 (11)
  • [50] Mechanical properties of Nb2O5 and Ta2O5 prepared by different procedures
    O. B. Shcherbina
    M. N. Palatnikov
    V. V. Efremov
    Inorganic Materials, 2012, 48 : 433 - 438