A study of hydrogen plasma-induced charging effect in EUV lithography systems

被引：0
|
作者：
Huang, Yao-Hung [1 ]
Lin, Chrong Jung [1 ]
King, Ya-Chin [1 ]
机构：
[1] Natl Tsing Hua Univ, Inst Elect Engn, Hsinchu, Taiwan
来源：
DISCOVER NANO | 2023年 / 18卷 / 01期
关键词：
Extreme ultraviolet (EUV); Lithography; EUV-induced hydrogen plasma;
D O I：
10.1186/s11671-023-03799-4
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
In the extreme ultraviolet lithography system, EUV-induced hydrogen plasma charging effect is observed by in situ embedded micro-detector array. The 4k-pixel on-wafer array can detect and store the distributions of H-2 plasma in each in-pixel floating gate for non-destructive off-line read. The local uniformity of H-2 plasma intensity extracted by the threshold voltages on an array and its distributions across a wafer by the average bit cell current of MDAs provide insights into the detailed conditions inside advanced EUV lithography chambers.
引用
收藏
页数：7
相关论文
共 50 条
  • [31] Plasma-induced charging damage in ultrathin (3-nm) gate oxides
    Chen, CC
    Lin, HC
    Chang, CY
    Liang, MS
    Chien, CH
    Hsien, SK
    Huang, TY
    Chao, TS
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2000, 47 (07) : 1355 - 1360
  • [32] Wafer-Level Mapping of Plasma-Induced Charging Effect by ON-Chip In Situ Recorders in FinFET Technologies
    Tsai, Yi-Pei
    Wu, Chun-Hsiung
    Lin, Chrong Jung
    King, Ya-Chin
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2016, 63 (06) : 2497 - 2502
  • [33] Loss of hydrogen atoms in H2 plasma on the surfaces of materials used in EUV lithography
    S. M. Zyryanov
    A. S. Kovalev
    D. V. Lopaev
    E. M. Malykhin
    A. T. Rakhimov
    T. V. Rakhimova
    K. N. Koshelev
    V. M. Krivtsun
    Plasma Physics Reports, 2011, 37 : 881 - 889
  • [34] Loss of Hydrogen Atoms in H2 Plasma on the Surfaces of Materials Used in EUV Lithography
    Zyryanov, S. M.
    Kovalev, A. S.
    Lopaev, D. V.
    Malykhin, E. M.
    Rakhimov, A. T.
    Rakhimova, T. V.
    Koshelev, K. N.
    Krivtsun, V. M.
    PLASMA PHYSICS REPORTS, 2011, 37 (10) : 881 - 889
  • [35] Effect of the plasma-induced magnetic field on a magnetic nozzle
    Merino, Mario
    Ahedo, Eduardo
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2016, 25 (04):
  • [36] Effect of plasma-induced polymerization on contact angle of paper
    Song, Zhaoping
    Li, Junrong
    Xiao, Huining
    ADVANCES IN CHEMICAL ENGINEERING, PTS 1-3, 2012, 396-398 : 1619 - 1623
  • [37] Inspection of Stochastic Defects With Broadband Plasma Optical Systems for Extreme Ultraviolet (EUV) Lithography
    Sah, Kaushik
    Halder, Sandip
    Cross, Andrew
    Leray, Philippe
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2020, 33 (01) : 23 - 31
  • [38] Aspect ratio dependent plasma-induced charging damage in rf precleaning of a metal contact
    Kim, J
    Shin, KS
    Park, WJ
    Kim, YJ
    Kang, CJ
    Ahn, TH
    Moon, JT
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2001, 19 (04): : 1835 - 1839
  • [39] Experimental investigation of materials damage induced by hot Xe plasma in EUV lithography devices
    Hassanein, A
    Burtseva, T
    Allain, JP
    Rice, BJ
    Bakshi, V
    Safronov, V
    EMERGING LITHOGRAPHIC TECHNOLOGIES VIII, 2004, 5374 : 122 - 132
  • [40] Plasma-induced formation of hydrogen resistant oxide layers on zirconium surface
    Evsin, A. E.
    Begrambekov, L. B.
    Kaplevsky, A. S.
    Kudashev, I. S.
    Gumarov, A., I
    Kashapov, N. F.
    Luchkin, A. G.
    Vakhitov, I. R.
    Yanilkin, I., V
    Tagirov, L. R.
    14TH INTERNATIONAL CONFERENCE ON FILMS AND COATINGS, 2019, 1281
12345