A study of hydrogen plasma-induced charging effect in EUV lithography systems

被引：0
|
作者：
Huang, Yao-Hung [1 ]
Lin, Chrong Jung [1 ]
King, Ya-Chin [1 ]
机构：
[1] Natl Tsing Hua Univ, Inst Elect Engn, Hsinchu, Taiwan
来源：
DISCOVER NANO | 2023年 / 18卷 / 01期
关键词：
Extreme ultraviolet (EUV); Lithography; EUV-induced hydrogen plasma;
D O I：
10.1186/s11671-023-03799-4
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
In the extreme ultraviolet lithography system, EUV-induced hydrogen plasma charging effect is observed by in situ embedded micro-detector array. The 4k-pixel on-wafer array can detect and store the distributions of H-2 plasma in each in-pixel floating gate for non-destructive off-line read. The local uniformity of H-2 plasma intensity extracted by the threshold voltages on an array and its distributions across a wafer by the average bit cell current of MDAs provide insights into the detailed conditions inside advanced EUV lithography chambers.
引用
收藏
页数：7
相关论文
共 50 条
  • [41] Exploring the electron density in plasma induced by EUV radiation: I. Experimental study in hydrogen
    van der Horst, R. M.
    Beckers, J.
    Osorio, E. A.
    Astakhov, D. I.
    Goedheer, W. J.
    Lee, C. J.
    Ivanov, V. V.
    Krivtsum, V. M.
    Koshelev, K. N.
    Lopaev, D. V.
    Bijkerk, F.
    Banine, V. Y.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2016, 49 (14)
  • [42] ELECTRONIC STUDY OF PLASMA-INDUCED DAMAGE IN GAAS HETEROSTRUCTURES
    ZAPPE, HP
    MICROELECTRONIC ENGINEERING, 1993, 20 (03) : 227 - 239
  • [43] The study of UHMWPEF surface modification with plasma-induced polymerization
    Zhang, Yu-Fang
    Jia, Qing-Xiu
    Wang, Xin
    Zhang, Pei-Ran
    2015 GLOBAL CONFERENCE ON POLYMER AND COMPOSITE MATERIALS (PCM2015), 2015, 87
  • [44] Study of effects of plasma-induced charging damage on hot-carrier lifetime using pre-stressed data
    Bhuva, B.
    Mongkolkachit, P.
    Bui, N.
    Kerns, S.
    International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings, 1999, : 69 - 72
  • [45] Dynamics of the ion energy spectrum in EUV-induced hydrogen plasma
    A. A. Abrikosov
    O. F. Yakushev
    D. V. Lopaev
    V. M. Krivtsun
    Plasma Physics Reports, 2017, 43 : 614 - 620
  • [46] Research on efficient and stable control of EUV-induced hydrogen plasma
    Mao, Qijun
    Gong, Xuepeng
    Lu, Qipeng
    Song, Yuan
    Wang, Dazhuang
    Bai, Yang
    Ma, Tianyu
    JOURNAL OF APPLIED PHYSICS, 2022, 131 (23)
  • [47] Ion energy distributions in highly transient EUV induced plasma in hydrogen
    1600, American Institute of Physics Inc. (123):
  • [48] Dynamics of the ion energy spectrum in EUV-induced hydrogen plasma
    Abrikosov, A. A.
    Yakushev, O. F.
    Lopaev, D. V.
    Krivtsun, V. M.
    PLASMA PHYSICS REPORTS, 2017, 43 (06) : 614 - 620
  • [49] Ion energy distributions in highly transient EUV induced plasma in hydrogen
    van de Ven, T. H. M.
    Reefman, P.
    de Meijere, C. A.
    van der Horst, R. M.
    van Kampen, M.
    Banine, V. Y.
    Beckers, J.
    JOURNAL OF APPLIED PHYSICS, 2018, 123 (06)
  • [50] Correlation of plasma-induced charging voltage measured in-situ by microelectromechanical sensors with device degradation
    Pangal, K
    Sturm, JC
    1997 2ND INTERNATIONAL SYMPOSIUM ON PLASMA PROCESS-INDUCED DAMAGE, 1997, : 203 - 206
12345