An Innovative Program Scheme for Reducing Z-Interference in Charge-Trap-Based 3-D NAND Flash Memory
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作者:
Ahn, Sangmin
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Seoul Natl Univ, Dept Elect & Comp Engn, Seoul 08826, South KoreaSeoul Natl Univ, Dept Elect & Comp Engn, Seoul 08826, South Korea
Ahn, Sangmin
[1
]
Jo, Hyungjun
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Seoul Natl Univ, Dept Elect & Comp Engn, Seoul 08826, South KoreaSeoul Natl Univ, Dept Elect & Comp Engn, Seoul 08826, South Korea
Jo, Hyungjun
[1
]
Kim, Sungju
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Seoul Natl Univ, Dept Elect & Comp Engn, Seoul 08826, South KoreaSeoul Natl Univ, Dept Elect & Comp Engn, Seoul 08826, South Korea
Kim, Sungju
[1
]
Park, Sechun
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机构:
SK Hynix Inc, NAND Design Team, Icheon Si 17336, South KoreaSeoul Natl Univ, Dept Elect & Comp Engn, Seoul 08826, South Korea
Park, Sechun
[2
]
Lim, Kyunam
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SK Hynix Inc, NAND Design Team, Icheon Si 17336, South KoreaSeoul Natl Univ, Dept Elect & Comp Engn, Seoul 08826, South Korea
Lim, Kyunam
[2
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Kim, Jongwoo
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SK Hynix Inc, NAND Design Team, Icheon Si 17336, South KoreaSeoul Natl Univ, Dept Elect & Comp Engn, Seoul 08826, South Korea
Kim, Jongwoo
[2
]
Shin, Hyungcheol
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Seoul Natl Univ, Dept Elect & Comp Engn, Seoul 08826, South Korea
Integra Semicond Co Ltd, Seoul 06970, South KoreaSeoul Natl Univ, Dept Elect & Comp Engn, Seoul 08826, South Korea
Shin, Hyungcheol
[1
,3
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机构:
[1] Seoul Natl Univ, Dept Elect & Comp Engn, Seoul 08826, South Korea
[2] SK Hynix Inc, NAND Design Team, Icheon Si 17336, South Korea
[3] Integra Semicond Co Ltd, Seoul 06970, South Korea
In this brief, we propose an innovative program scheme to mitigatez-direction interference(Z-interference) in charge-trap-based 3-DNANDflash memory. Our approach adjusts the position of trapped electronsin charge trap nitride (CTN) layer during the program oper-ation by varying the pass voltage (V-pass) on both side wordlines (WLs) of the selected WL. Specifically, cells with a high threshold voltage (V-th) place electrons in the program direction, whereas cells with a low V-th place electrons inthe opposite direction. Depending on the program-verify(PV) level pattern of the aggressor (Agr)-victim cell (Vic),the effective gate pitch can be modified, even though the physical gate pitch is fixed. We validate our proposed scheme using technology computer-aided design (TCAD)simulations and experimental measurements.
机构:
School of Optics and Electronic Information,Huazhong University of Science and TechnologySchool of Optics and Electronic Information,Huazhong University of Science and Technology
Liu Shijun
Zou Xuecheng
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School of Optics and Electronic Information,Huazhong University of Science and TechnologySchool of Optics and Electronic Information,Huazhong University of Science and Technology
机构:
Seoul Natl Univ, Interuniv Semicond Res Ctr, Sch Elect Engn & Comp Sci, Seoul 151742, South KoreaSeoul Natl Univ, Interuniv Semicond Res Ctr, Sch Elect Engn & Comp Sci, Seoul 151742, South Korea
Kim, Minsoo
Kim, Sungbak
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机构:
SK Hynix Inc, Flash Adv Design Team, Icheon Si 17336, South KoreaSeoul Natl Univ, Interuniv Semicond Res Ctr, Sch Elect Engn & Comp Sci, Seoul 151742, South Korea
Kim, Sungbak
Shin, Hyungcheol
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机构:
Seoul Natl Univ, Interuniv Semicond Res Ctr, Sch Elect Engn & Comp Sci, Seoul 151742, South KoreaSeoul Natl Univ, Interuniv Semicond Res Ctr, Sch Elect Engn & Comp Sci, Seoul 151742, South Korea
机构:
Seoul Natl Univ, Interuniv Semicond Res Ctr, Dept Elect & Comp Engn, Seoul 08826, South KoreaSeoul Natl Univ, Interuniv Semicond Res Ctr, Dept Elect & Comp Engn, Seoul 08826, South Korea
Jo, Hyungjun
Kim, Jongwoo
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机构:
SK Hynix Inc, NAND Design Team, Icheon Si 17336, South KoreaSeoul Natl Univ, Interuniv Semicond Res Ctr, Dept Elect & Comp Engn, Seoul 08826, South Korea
Kim, Jongwoo
Cho, Yonggyu
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机构:
SK Hynix Inc, NAND Design Team, Icheon Si 17336, South KoreaSeoul Natl Univ, Interuniv Semicond Res Ctr, Dept Elect & Comp Engn, Seoul 08826, South Korea
Cho, Yonggyu
Shim, Hyunyoung
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机构:
SK Hynix Inc, NAND Design Team, Icheon Si 17336, South KoreaSeoul Natl Univ, Interuniv Semicond Res Ctr, Dept Elect & Comp Engn, Seoul 08826, South Korea
Shim, Hyunyoung
Sim, Jaesung
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机构:
SK Hynix Inc, NAND Design Team, Icheon Si 17336, South KoreaSeoul Natl Univ, Interuniv Semicond Res Ctr, Dept Elect & Comp Engn, Seoul 08826, South Korea
Sim, Jaesung
Shin, Hyungcheol
论文数: 0引用数: 0
h-index: 0
机构:
Seoul Natl Univ, Interuniv Semicond Res Ctr, Dept Elect & Comp Engn, Seoul 08826, South Korea
Integra Semicond Ltd, Seoul 06970, South KoreaSeoul Natl Univ, Interuniv Semicond Res Ctr, Dept Elect & Comp Engn, Seoul 08826, South Korea