共 50 条
- [21] Model for electromigration failure distributions of contacts and vias in advanced IC technologies Int Conf Solid State Integr Circuit Technol Proc, (234-237):
- [22] A model for electromigration failure distributions of contacts and vias in advanced IC technologies 1998 5TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY PROCEEDINGS, 1998, : 234 - 237
- [24] Technology Innovations in Selective ALD for Next-Generation Contacts and Vias 2018 IEEE 2ND ELECTRON DEVICES TECHNOLOGY AND MANUFACTURING CONFERENCE (EDTM 2018), 2018, : 102 - 103
- [25] Copper Electrodeposition Parameters Optimization for Through-Silicon Vias Filling PROCESSING, MATERIALS, AND INTEGRATION OF DAMASCENE AND 3D INTERCONNECTS, 2010, 25 (38): : 109 - 118
- [27] Filling in the Picture: Contexts and Contacts of Jane Cavendish LITERATURE COMPASS, 2008, 5 (02):
- [28] Voltage contrast defect inspection of contacts and vias for deep quarter micron devices JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (12B): : 7168 - 7172
- [29] Novel test strategy for statistical evaluation of defect density and reliability of contacts and VIAS 2005 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 43RD ANNUAL, 2005, : 678 - 679
- [30] An electromigration failure model of tungsten plug contacts/vias for realistic lifetime prediction 1996 SYMPOSIUM ON VLSI TECHNOLOGY: DIGEST OF TECHNICAL PAPERS, 1996, : 192 - 193