Filling contacts and vias: a progress report

被引:0
|
作者
机构
来源
Semicond Int | / 2卷 / 4pp期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
Integrated circuit manufacture
引用
收藏
相关论文
共 50 条
  • [31] Electromigration failure of contacts and vias in sub-micron integrated circuit metallizations
    AT&T Bell Lab, Orlando, United States
    Microelectron Reliab, 7-8 (925-953):
  • [32] A LABORATORY AND CLINICAL COMPARISON OF SILICATE CEMENTS AND A DIRECT-FILLING RESIN - A PROGRESS REPORT
    BOWEN, RL
    PAFFENBARGER, GC
    MULLINEA.AL
    JOURNAL OF PROSTHETIC DENTISTRY, 1968, 20 (05): : 426 - +
  • [33] Integration of chemical vapor deposition titanium nitride for 0.25 μm contacts and vias
    Westerheim, AC
    Bulger, JM
    Whelan, CS
    Sriram, TS
    Elliott, LJ
    Maziarz, JJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (05): : 2729 - 2733
  • [34] Failure Analysis of Faulty vias or Contacts in Mixed-Signal Integrated Circuits
    Wu, Chunlei
    IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY, 2018, 18 (04) : 568 - 573
  • [35] Voltage contrast defect inspection of contacts and vias for deep quarter micron devices
    Yamazaki, Yuichiro
    Hayashi, Hiroyuki
    Miyoshi, Motosuke
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1999, 38 (12 B): : 7168 - 7172
  • [36] Electromigration failure of contacts and vias in sub-micron integrated circuit metallizations
    Oates, AS
    MICROELECTRONICS AND RELIABILITY, 1996, 36 (7-8): : 925 - 953
  • [37] Modeling the Bottom-Up Filling of Through Silicon Vias with Different Additives
    Wang, Zuyang
    Luo, Wei
    Gao, Liming
    Li, Ming
    2014 15TH INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING TECHNOLOGY (ICEPT), 2014, : 618 - 621
  • [38] Effects of additives with different acids on the through-silicon vias copper filling
    Wang, Fuliang
    Liu, Wei
    Wang, Yan
    MICROELECTRONIC ENGINEERING, 2018, 200 : 51 - 55
  • [39] INNOVATVE ACID COPPER PROCESS FOR SIMULTANEOUSLY FILLING VIAS AND PLATING THROUGH HOLES
    Nikolova, Maria
    Rodriguez, Confesol
    Bowerman, William
    Watkowski, Jim
    Feng, Kesheng
    2017 12TH INTERNATIONAL MICROSYSTEMS, PACKAGING, ASSEMBLY AND CIRCUITS TECHNOLOGY CONFERENCE (IMPACT), 2017, : 107 - 110
  • [40] Bottom-Up Copper Filling of Millimeter Size Through Silicon Vias
    Josell, D.
    Menk, L. A.
    Hollowell, A. E.
    Blain, M.
    Moffat, T. P.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2019, 166 (01) : D3254 - D3258