共 50 条
- [45] Electrical characterization of silicon dioxide thin film prepared by ArF excimer laser chemical vapor deposition from silicon tetraacetate JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1997, 36 (2A): : L150 - L153
- [46] Bolometric properties of silicon thin-film structures fabricated by plasmachemical vapor-phase deposition Technical Physics Letters, 1997, 23 : 481 - 483
- [47] Bolometric properties of silicon thin-film structures fabricated by plasmachemical vapor-phase deposition Technical Physics Letters, 23 (06):
- [49] Chemical vapor deposition of amorphous silicon carbide thin films on metal surfaces using monomethylsilane gas at low temperatures SURFACE & COATINGS TECHNOLOGY, 2013, 217 : 88 - 93