CO2 laser chemical vapor deposition of amorphous silicon. Gas phase processes and thin film properties

被引:0
|
作者
机构
[1] Golusda, E.
[2] Luehmann, K.-D.
[3] Mollekopf, G.
[4] Stafast, H.
[5] Wacker, M.
来源
Golusda, E. | 1600年 / 95期
关键词
Silicon And Alloys;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] CO2-LASER CHEMICAL VAPOR-DEPOSITION OF AMORPHOUS-SILICON - GAS-PHASE PROCESSES AND THIN-FILM PROPERTIES
    GOLUSDA, E
    LUHMANN, KD
    MOLLEKOPF, G
    STAFAST, H
    WACKER, M
    BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 1991, 95 (11): : 1414 - 1416
  • [2] EXCIMER-LASER-INDUCED CHEMICAL VAPOR DEPOSITION OF HYDROGENATED AMORPHOUS SILICON.
    Yamada, Akira
    Konagai, Makoto
    Takahashi, Kiyoshi
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes, 1985, 24 (12): : 1586 - 1589
  • [3] DEPOSITION OF AMORPHOUS-SILICON NITRIDE THIN-FILMS BY CO2 LASER-INDUCED CHEMICAL-VAPOR-DEPOSITION
    SERRA, J
    SZORENYI, T
    FERNANDEZ, D
    GONZALEZ, P
    GARCIA, E
    POU, J
    LEON, B
    PEREZAMOR, M
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1995, 187 : 353 - 360
  • [5] CHEMICAL VAPOR-DEPOSITION OF AMORPHOUS HYDROGENATED SILICON WITH A CO2-LASER - CHEMICAL MECHANISM
    HESCH, K
    KARSTENS, H
    HESS, P
    THIN SOLID FILMS, 1992, 218 (1-2) : 29 - 39
  • [6] LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON .2. FILM PROPERTIES
    MEUNIER, M
    FLINT, JH
    HAGGERTY, JS
    ADLER, D
    JOURNAL OF APPLIED PHYSICS, 1987, 62 (07) : 2822 - 2829
  • [7] Room temperature process for chemical vapor deposition of amorphous silicon carbide thin film using monomethylsilane gas
    Habuka, Hitoshi
    Ando, Yusuke
    Tsuji, Masaki
    SURFACE & COATINGS TECHNOLOGY, 2011, 206 (06): : 1503 - 1506
  • [8] Co2-laser-assisted plasma-enhanced chemical vapor deposition of silicon dioxide thin film
    Tsai, Hung-Sheng
    Chiu, Hsin-Ching
    Chang, Sheng-Hsiung
    Cheng, Chao-Chia
    Lee, Ching-Ting
    Liu, Hai-Pei
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2001, 40 (5 A): : 3093 - 3095
  • [9] CO2-laser-assisted plasma-enhanced chemical vapor deposition of silicon dioxide thin film
    Tsai, HS
    Chiu, HC
    Chang, SH
    Cheng, CC
    Lee, CT
    Liu, HP
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (5A): : 3093 - 3095
  • [10] Amorphous silicon film deposition by low temperature catalytic chemical vapor deposition (<150°C) and laser crystallization for polycrystalline silicon thin-film transistor application
    Lee, Sung-Hyun
    Hong, Wan-Shick
    Kim, Jong-Man
    Lim, Hyuck
    Park, Kuyng-Bae
    Cho, Chul-Lae
    Lee, Kyung-Eun
    Kim, Do-Young
    Jung, Ji-Sim
    Kwon, Jang-Yeon
    Noguchi, Takashi
    Japanese Journal of Applied Physics, Part 2: Letters, 2006, 45 (8-11):