EXCIMER-LASER-INDUCED CHEMICAL VAPOR DEPOSITION OF HYDROGENATED AMORPHOUS SILICON.

被引：0
|
作者：
Yamada, Akira [1 ]
Konagai, Makoto [1 ]
Takahashi, Kiyoshi [1 ]
机构：
[1] Tokyo Inst of Technology, Tokyo, Jpn, Tokyo Inst of Technology, Tokyo, Jpn
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes | 1985年 / 24卷 / 12期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
SEMICONDUCTING SILICON
引用
下载
收藏
页码：1586 / 1589
相关论文
共 50 条
  • [1] EXCIMER-LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON
    YAMADA, A
    KONAGAI, M
    TAKAHASHI, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1985, 24 (12): : 1586 - 1589
  • [2] EXCIMER-LASER-INDUCED CRYSTALLIZATION OF HYDROGENATED AMORPHOUS-SILICON
    WINER, K
    ANDERSON, GB
    READY, SE
    BACHRACH, RZ
    JOHNSON, RI
    PONCE, FA
    BOYCE, JB
    APPLIED PHYSICS LETTERS, 1990, 57 (21) : 2222 - 2224
  • [3] DOPED HYDROGENATED AMORPHOUS-SILICON FILMS BY LASER-INDUCED CHEMICAL VAPOR-DEPOSITION
    BRANZ, HM
    FAN, S
    FLINT, JH
    FISKE, BT
    ADLER, D
    HAGGERTY, JS
    APPLIED PHYSICS LETTERS, 1986, 48 (02) : 171 - 173
  • [4] HYDROGENATED AMORPHOUS-SILICON PRODUCED BY LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF SILANE
    MEUNIER, M
    FLINT, JH
    ADLER, D
    HAGGERTY, JS
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1983, 59-6 (DEC) : 699 - 702
  • [5] HYDROGENATED AMORPHOUS-SILICON PRODUCED BY LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF SILANE
    MEUNIER, M
    GATTUSO, TR
    ADLER, D
    HAGGERTY, JS
    APPLIED PHYSICS LETTERS, 1983, 43 (03) : 273 - 275
  • [6] Silica deposition by excimer-laser-induced chemical vapour deposition in perpendicular configuration
    Leon, B
    Klumpp, A
    Gonzalez, P
    Parada, EG
    Fernandez, D
    Pou, J
    Serra, J
    Sigmund, H
    PerezAmor, M
    ADVANCED MATERIALS FOR OPTICS AND ELECTRONICS, 1996, 6 (02): : 83 - 92
  • [7] INITIAL STAGE OF LASER-INDUCED SELECTIVE CHEMICAL VAPOR DEPOSITION OF SILICON.
    Tanaka, Takeshi
    Deguchi, Koji
    Hirose, Masataka
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes, 1987, 26 (12): : 2057 - 2060
  • [8] CHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON
    KURTZ, SR
    PROSCIA, J
    GORDON, RG
    JOURNAL OF APPLIED PHYSICS, 1986, 59 (01) : 249 - 256
  • [9] CHEMICAL VAPOR-DEPOSITION OF AMORPHOUS HYDROGENATED SILICON WITH A CO2-LASER - CHEMICAL MECHANISM
    HESCH, K
    KARSTENS, H
    HESS, P
    THIN SOLID FILMS, 1992, 218 (1-2) : 29 - 39
  • [10] Excimer-laser-induced micropatterning of silicon dioxide on silicon substrates
    Yu, JJ
    Zhang, JY
    Boyd, IW
    Lu, YF
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2001, 72 (01): : 35 - 39
12345