Excimer laser reactive ablation deposition of silicon nitride films

被引：0
|
作者：
机构：
[1] D'Anna, E.
[2] Leggieri, G.
[3] Luches, A.
[4] Martino, M.
[5] Perrone, A.
[6] Majni, G.
[7] Mengucci, P.
[8] Alexandrescu, R.
[9] Mihailescu, I.N.
[10] Zemek, J.
来源：
D'Anna, E. | 1600年 / Elsevier Science B.V., Amsterdam, Netherlands卷 / 86期
关键词：
Laser reactive ablation - Profilometry;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [31] Carbon nitride films deposited by reactive laser ablation
    Barucca, G
    Mengucci, P
    Leggieri, G
    Mihailescu, IN
    ELECTRON MICROSCOPY 1998, VOL 2: MATERIALS SCIENCE 1, 1998, : 715 - 716
  • [32] Deposition of tantalum oxide films by ArF excimer laser ablation
    Nishimura, Y
    Shinkawa, A
    Ujita, H
    Tsuji, M
    Nakamura, M
    APPLIED SURFACE SCIENCE, 1998, 136 (1-2) : 22 - 28
  • [33] EXCIMER-LASER REACTIVE ABLATION - AN EFFICIENT APPROACH FOR THE DEPOSITION OF HIGH-QUALITY TIN FILMS
    MIHAILESCU, IN
    CHITICA, N
    TEODORESCU, VS
    DEGIORGI, ML
    LEGGIERI, G
    LUCHES, A
    MARTINO, M
    PERRONE, A
    DUBREUIL, B
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (05): : 2577 - 2582
  • [34] Excimer laser ablation of aluminum nitride
    Janet K. Lumpp
    Susan D. Allen
    Journal of Materials Research, 1997, 12 : 218 - 225
  • [35] Excimer laser ablation of aluminum nitride
    Lumpp, JK
    Allen, SD
    JOURNAL OF MATERIALS RESEARCH, 1997, 12 (01) : 218 - 225
  • [36] Carbon nitride films deposited by very high-fluence XeCl excimer-laser reactive ablation
    Acquaviva, S
    D'Anna, E
    De Giorgi, ML
    Fernández, M
    Leggieri, G
    Luches, A
    Zocco, A
    Majni, G
    APPLIED SURFACE SCIENCE, 2000, 154 : 369 - 375
  • [37] LASER REACTIVE ABLATION DEPOSITION OF TITANIUM CARBIDE FILMS
    LEGGIERI, G
    LUCHES, A
    MARTINO, M
    PERRONE, A
    MAJNI, G
    MENGUCCI, P
    MIHAILESCU, IN
    THIN SOLID FILMS, 1995, 258 (1-2) : 40 - 45
  • [38] Microstructure on titanium oxide and silicon nitride formed by KrF excimer laser ablation
    Shimoda, T
    Takahashi, K
    Obara, M
    CLEO(R)/PACIFIC RIM 2001, VOL I, TECHNICAL DIGEST, 2001, : 32 - 33
  • [39] Modification of silicon nitride films to oxynitrides by ArF excimer laser irradiation
    Serra, J
    Parada, EG
    Gonzalez, P
    Fernandez, D
    Chiussi, S
    Pou, J
    Leon, B
    PerezAmor, M
    SURFACE & COATINGS TECHNOLOGY, 1996, 80 (1-2): : 211 - 215
  • [40] Deposition of crystal polythiophene thin films by KrF excimer laser ablation
    Lu, YF
    Ren, ZM
    Mai, ZH
    Chong, TC
    Ng, SC
    Miao, P
    Cheong, BA
    Chow, SK
    Liew, TYF
    JOURNAL OF MATERIALS RESEARCH, 2000, 15 (02) : 536 - 540
12345