Compact electron cyclotron resonance plasma-etching reactor employing permanent magnet

被引:0
|
作者
机构
[1] Narai, Akira
[2] Hashimoto, Tetsuro
[3] Ichihashi, Hideki
[4] Shindo, Haruo
[5] Horiike, Yasuhiro
来源
Narai, Akira | 1600年 / 30期
关键词
Semiconducting Silicon;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [41] EXTREMELY HIGH-SELECTIVE ELECTRON-CYCLOTRON RESONANCE PLASMA-ETCHING FOR PHOSPHORUS-DOPED POLYCRYSTALLINE SILICON
    SAMUKAWA, S
    SUZUKI, Y
    SASAKI, M
    APPLIED PHYSICS LETTERS, 1990, 57 (04) : 403 - 405
  • [42] ADVANCED ELECTRON-CYCLOTRON-RESONANCE PLASMA-ETCHING TECHNOLOGY FOR PRECISE ULTRA-LARGE-SCALE INTEGRATION PATTERNING
    SAMUKAWA, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (01): : 112 - 115
  • [43] 400 KHZ RADIOFREQUENCY BIASED ELECTRON-CYCLOTRON RESONANCE PLASMA-ETCHING FOR AL-SI-CU PATTERNING
    SAMUKAWA, S
    TOYOSATO, T
    WANI, E
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (03): : 1471 - 1477
  • [44] PARALLEL PLATE PLASMA-ETCHING REACTOR MODEL - UNIFORMITY OF ETCHING
    ECONOMOU, D
    PARK, SK
    WILLIAMS, G
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (03) : C126 - C126
  • [45] Boundary effect on mode transformation in an electron cyclotron resonance etching reactor
    Tamura, Hitoshi
    Tetsuka, Tsutomu
    Sekine, Tomohiro
    Shinohara, Shunjiro
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2022, 61 (05)
  • [46] Cu metallization using a permanent magnet electron cyclotron resonance microwave plasma/sputtering hybrid system
    Gorbatkin, SM
    Poker, DB
    Rhoades, RL
    Doughty, C
    Berry, LA
    Rossnagel, SM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (03): : 1853 - 1859
  • [47] CU DEPOSITION USING A PERMANENT-MAGNET ELECTRON-CYCLOTRON-RESONANCE MICROWAVE PLASMA SOURCE
    BERRY, LA
    GORBATKIN, SM
    RHOADES, RL
    THIN SOLID FILMS, 1994, 253 (1-2) : 382 - 385
  • [48] Enhanced production of electron cyclotron resonance plasma by exciting selective microwave mode on a large-bore electron cyclotron resonance ion source with permanent magnet
    Kimura, Daiju
    Kurisu, Yosuke
    Nozaki, Dai
    Yano, Keisuke
    Imai, Youta
    Kumakura, Sho
    Sato, Fuminobu
    Kato, Yushi
    Iida, Toshiyuki
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2014, 85 (02):
  • [49] TUNGSTEN ETCHING USING AN ELECTRON-CYCLOTRON-RESONANCE PLASMA
    MARUYAMA, T
    FUJIWARA, N
    SHIOZAWA, K
    YONEDA, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03): : 810 - 814
  • [50] Characterization of electron cyclotron resonance source plasma for etching and deposition
    Angra, SK
    Kumar, P
    Banerjie, PC
    Bajpai, RP
    THIN SOLID FILMS, 1997, 304 (1-2) : 294 - 298