TUNGSTEN ETCHING USING AN ELECTRON-CYCLOTRON-RESONANCE PLASMA

被引：14
|
作者：
MARUYAMA, T
FUJIWARA, N
SHIOZAWA, K
YONEDA, M
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1995年 / 13卷 / 03期
关键词：
D O I：
10.1116/1.579832
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：810 / 814
页数：5
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