Growth of epitaxial β-FeSi2 on (100) silicon using Fe-Ti-Si diffusion couples

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Kyllesbech, Larsen, K.
Tavares, J.
Bender, H.
Donaton, R.A.
Lauwers, A.
Maex, K.
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Journal of Applied Physics | 1995年 / 78卷 / 01期
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