Ga-As-H-Cl VAPOR PHASE EPITAXIAL GROWTH SYSTEM.

被引：0

作者：

Han, H.G. ^{[1
]}

Rao, Y.K. ^{[1
]}

机构：

[1] Univ of Washington, Dep of Materials, Science & Engineering, Seattle,, WA, USA, Univ of Washington, Dep of Materials Science & Engineering, Seattle, WA, USA

来源：

Metallurgical transactions. B, Process metallurgy | 1985年 / 16 B卷 / 01期

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页码：97 / 105

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