Evaluation of the waveguide effect in proximity x-ray lithography using an optical trace method

被引：0
|
作者：
机构：
[1] Ogawa, Taro
[2] Murayama, Seiichi
[3] Ito, Masaaki
[4] Matsuzaka, Takashi
来源：
Ogawa, Taro | 1600年 / JJAP, Minato-ku, Japan卷 / 34期
关键词：
X ray lithography;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] Characterization of acid diffusion for a negative chemically amplified resist using X-ray proximity lithography
    Choi, BK
    Yang, JS
    Lee, KH
    Kim, O
    MICROELECTRONIC ENGINEERING, 1998, 42 : 301 - 304
  • [42] Fabrication of X-Ray Gratings Using X-Ray Lithography Technique for X-Ray Talbot Interferometer
    Noda, Daiji
    Tsujii, Hiroshi
    Takahashi, Naoki
    Hattori, Tadashi
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2009, 156 (05) : H299 - H302
  • [43] X-RAY LITHOGRAPHY
    SULLIVAN, PA
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1977, 22 (03): : 276 - 276
  • [44] X-RAY LITHOGRAPHY
    FEDER, R
    SPILLER, E
    TOPALIAN, J
    POLYMER ENGINEERING AND SCIENCE, 1977, 17 (06): : 385 - 389
  • [45] X-RAY LITHOGRAPHY
    SMITH, HI
    FLANDERS, DC
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 : 61 - 65
  • [46] FABRICATION OF OPTICAL-DEVICES BY X-RAY LITHOGRAPHY BY USING SYNCHROTRON RADIATION
    ARITOME, A
    MATSUI, S
    MORIWAKI, K
    HASEGAWA, A
    NAMBA, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : C153 - C153
  • [47] Microprocessing Using X-Ray Lithography in NewSUBARU
    Amano S.
    Journal of Japan Institute of Electronics Packaging, 2023, 26 (05) : 483 - 487
  • [48] Fabrication of Waveguide Butler Matrix for Short Millimeter-Wave Using X-Ray Lithography
    Kishihara, Mitsuyoshi
    Yamaguchi, Akinobu
    Utsumi, Yuichi
    Ohta, Isao
    2017 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM (IMS), 2017, : 564 - 567
  • [49] Vertical synchrotron radiation beamline for proximity X-ray lithography: Theoretical analysis
    Bukreeva, IN
    Kozhevnikov, IV
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1997, 395 (02): : 244 - 258
  • [50] EVALUATION OF X-RAY RESISTS FOR SUBMICRON LITHOGRAPHY.
    Redaelli, R.
    Wells, G.M.
    Cerrina, F.
    Crapella, S.
    Vento, G.
    Microelectronic Engineering, 1987, 6 (1-4) : 519 - 525
12345