Evaluation of the waveguide effect in proximity x-ray lithography using an optical trace method

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机构：
[1] Ogawa, Taro
[2] Murayama, Seiichi
[3] Ito, Masaaki
[4] Matsuzaka, Takashi
来源：
Ogawa, Taro | 1600年 / JJAP, Minato-ku, Japan卷 / 34期
关键词：
X ray lithography;
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