Fabrication of X-Ray Gratings Using X-Ray Lithography Technique for X-Ray Talbot Interferometer

The X-ray radiographic imaging technique is very important in medical, biological, inspection, material science, and other fields. However, it is not enough to obtain a clear X-ray image of samples with low absorbance materials, such as biological soft tissues. Then, we have used an X-ray phase-imaging method of an X-ray Talbot interferometer. In this method, X-ray gratings were required to have a narrow pitch and high aspect ratio structure. Therefore, we have developed and fabricated high-aspect-ratio X-ray gratings with a pitch of 5.3 mu m, a height of 30 mu m, and a large effective area of 100 X 100 mm using X-ray lithography and narrow electroforming techniques. In this paper, we discuss the fabrication process of X-ray gratings with a narrow pitch and high-aspect-ratio structure, and results of X-ray phase tomography using an X-ray Talbot interferometer with these X-ray gratings. (C) 2009 The Electrochemical Society. [DOI: 10.1149/1.3082377] All rights reserved.