共 50 条
- [1] Elimination the CMP Defects for TSV Process by Optimizing the Copper Electrodeposition 2017 18TH INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING TECHNOLOGY (ICEPT), 2017, : 1147 - 1151
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- [6] Integrated Product and Process For Copper and Barrier CMP CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE 2010 (CSTIC 2010), 2010, 27 (01): : 569 - 574
- [7] Development of a production worthy copper CMP process ASMC 98 PROCEEDINGS - 1998 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP: THEME - SEMICONDUCTOR MANUFACTURING: MEETING THE CHALLENGES OF THE GLOBAL MARKETPLACE, 1998, : 354 - 363
- [8] A STUDY OF SURFACE DEFECTS OF GaN DURING CMP PROCESS 2015 INTERNATIONAL CONFERENCE ON PLANARIZATION/CMP TECHNOLOGY (ICPT), 2015,
- [9] Defect characterization and control in the development of a copper CMP process CHEMICAL MECHANICAL PLANARIZATION IN IC DEVICE MANUFACTURING III, PROCEEDINGS, 2000, 99 (37): : 168 - 176