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- [41] Hybrid CMP process for copper and ultra low-k materials integration ADVANCED METALLIZATION CONFERENCE 2003 (AMC 2003), 2004, : 113 - 119
- [43] Development of a copper CMP process for multilevel, dual inlaid metallization in semiconductor devices CHEMICAL MECHANICAL PLANARIZATION IN INTEGRATED CIRCUIT DEVICE MANUFACTURING, 1998, 98 (07): : 9 - 18
- [44] Development of a non-contact post-CMP cleaning process for copper PARTICLES ON SURFACES 9: DETECTION, ADHESION AND REMOVAL, 2006, : 127 - +
- [45] New CMP process that inhibits delamination of copper low-k integration PROCEEDINGS OF THE IEEE 2006 INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE, 2006, : 128 - +
- [48] On classifying unitary modules by their Dirac cohomology Science China Mathematics, 2017, 60 : 1937 - 1962
- [49] Effect of glycine on copper CMP International Journal of Precision Engineering and Manufacturing-Green Technology, 2016, 3 : 155 - 159