SIMULATION OF ISOTOPIC MASS EFFECTS IN SPUTTERING.

被引：0

作者：

Shapiro, M.H. ^{[1
]}

Haff, P.K. ^{[1
]}

Tombrello, T.A. ^{[1
]}

Harrison Jr., Don E. ^{[1
]}

机构：

[1] California State Univ, Fullerton,, Dep of Physics, Fullerton, CA, USA, California State Univ, Fullerton, Dep of Physics, Fullerton, CA, USA

来源：

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1985年 / B12卷 / 01期

关键词：

The sputtering of multicomponent materials has received considerable attention recently [l]. Much of this work has been directed. toward the study of alloys or compounds where the analysis is complicated by the chemical forces between different target components and between the individual target components and the incident ion. Isotopic targets offer the opportunity to investigate those aspects of multicomponent sputtering that depend primarily on mass differences; while avoiding the complications of component dependent * Supported in part by the National Science Foundation IDMR83-06541 (Caltech) and DMR83-06548 (CSUF); by a Schlumberger-Doll Research Corp. grant (Caltech); by an Office of Naval Research Special Research Opportunity Grant (NPG); and by the Foundation Research Program of the Naval Postgraduate School;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：137 / 147

共 50 条

[21] TECHNOLOGY OF ION BEAM SOURCES USED IN SPUTTERING.
Kaufman, Harold R.
1600, (15):
[22] CURRENT INDUSTRIAL APPLICATIONS OF HIGH RATE SPUTTERING.
Smith Jr., Hugh R.
Metal Finishing, 1978, 76 (03) : 60 - 63
[23] Ti(C,N) COATINGS BY REACTIVE SPUTTERING.
Knotek, O.
Bosch, W.
Metal Powder Report, 1984, 39 (07) : 406 - 410
[24] CHAMBER FOR DEPOSITION OF THIN FILMS BY CATHODE SPUTTERING.
Paderno, Yu.B.
Zimin, V.A.
Instruments and experimental techniques New York, 1986, 29 (1 pt 2): : 253 - 255
[25] SURFACE BINDING ENERGY IN SLOW COLLISIONAL SPUTTERING.
Kelly, Roger
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1986, B18 (4-6) : 388 - 398
[26] SYNTHESIS OF MON AND RUN BY ACTIVE NITROGEN SPUTTERING.
Ihara, H.
Terada, N.
Senzaki, K.
Hirabayashi, M.
Kimura, Y.
Uzuka, R.
Kawashima, F.
Akimoto, M.
Kezuka, H.
IEEE Transactions on Magnetics, 1986, MAG-23 (02)
[27] MECHANISMS OF ATOMIC ION EMISSION DURING SPUTTERING.
Yu, Ming L.
Lang, Norton D.
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1985, B14 (4-6) : 403 - 413
[28] NEW TECHNIQUE FOR THE FORMATION OF ULTRAFINE PARTICLES BY SPUTTERING.
Yatsuya, Shigeki
Kamakura, Takanobu
Yamauchi, Kenji
Mihama, Kazuhiro
1600, (25):
[29] PASSIVATION OF ETCHED MIRROR LASER WITH ANGLED SPUTTERING.
Iga, Kenichi
Mori, Yoshihiro
Kotaki, Yuji
Bulletin of Research Laboratory of Precision Machinery and Electronics, 1986, (58): : 17 - 19
[30] Emission theory of amorphous-material sputtering. Energy dependence of the sputtering coefficient
Pustovit A.N.
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques, 2017, 11 (5) : 1069 - 1077

← 1 2 3 4 5 →