SIMULATION OF ISOTOPIC MASS EFFECTS IN SPUTTERING.

被引：0

作者：

Shapiro, M.H. ^{[1
]}

Haff, P.K. ^{[1
]}

Tombrello, T.A. ^{[1
]}

Harrison Jr., Don E. ^{[1
]}

机构：

[1] California State Univ, Fullerton,, Dep of Physics, Fullerton, CA, USA, California State Univ, Fullerton, Dep of Physics, Fullerton, CA, USA

来源：

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1985年 / B12卷 / 01期

关键词：

The sputtering of multicomponent materials has received considerable attention recently [l]. Much of this work has been directed. toward the study of alloys or compounds where the analysis is complicated by the chemical forces between different target components and between the individual target components and the incident ion. Isotopic targets offer the opportunity to investigate those aspects of multicomponent sputtering that depend primarily on mass differences; while avoiding the complications of component dependent * Supported in part by the National Science Foundation IDMR83-06541 (Caltech) and DMR83-06548 (CSUF); by a Schlumberger-Doll Research Corp. grant (Caltech); by an Office of Naval Research Special Research Opportunity Grant (NPG); and by the Foundation Research Program of the Naval Postgraduate School;

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页码：137 / 147

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