YIG ferrite thin-films epitaxially grown by reactive sputtering method

被引：0
|
作者：
Yamamoto, Setsuo [1 ]
Kuniki, Hirofumi [1 ]
Kurisu, Hiroki [1 ]
Matsuura, Mitsuru [1 ]
Jang, Pyungwoo [2 ]
机构：
[1] Yamaguchi Univ., 2-16-1 Tokiwadai, Ube 755-8611, Japan
[2] Chongju Univ., 36 Naeduck-dong, Sangdang-gu, Cheongju 360-764, Korea, Republic of
来源：
Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy | 2004年 / 51卷 / 03期
关键词：
D O I：
10.2497/jjspm.51.190
中图分类号：
学科分类号：
摘要：
3
引用
收藏
页码：190 / 194
相关论文
共 50 条
  • [21] THE CONTROL OF MAGNETIC CHARACTERISTICS OF BAM FERRITE THIN-FILMS BY BIAS SPUTTERING
    NAOE, M
    NOMA, K
    NAKAGAWA, S
    MATSUSHITA, N
    JOURNAL OF APPLIED PHYSICS, 1993, 73 (10) : 6696 - 6696
  • [22] REPRODUCIBILITY OF PROPERTIES OF SNOX THIN-FILMS PREPARED BY REACTIVE SPUTTERING
    BEENSHMARCHWICKA, G
    KROLSTEPNIEWSKA, L
    ELECTROCOMPONENT SCIENCE AND TECHNOLOGY, 1985, 11 (04): : 271 - 280
  • [23] THE REACTIVE SPUTTERING OF THIN-FILMS OF TIN AT LOW TARGET VOLTAGES
    SWADY, RA
    JAFER, HA
    HOWSON, RP
    VACUUM, 1993, 44 (3-4) : 297 - 301
  • [24] COPPER NITRIDE THIN-FILMS PREPARED BY RADIOFREQUENCY REACTIVE SPUTTERING
    MARUYAMA, T
    MORISHITA, T
    JOURNAL OF APPLIED PHYSICS, 1995, 78 (06) : 4104 - 4107
  • [25] CHARACTERIZATION OF TIN OXIDE THIN-FILMS DEPOSITED BY REACTIVE SPUTTERING
    STEDILE, FC
    DEBARROS, BAS
    LEITE, CVB
    FREIRE, FL
    BAUMVOL, IJR
    SCHREINER, WH
    THIN SOLID FILMS, 1989, 170 (02) : 285 - 291
  • [26] TITANIUM CARBIDE THIN-FILMS OBTAINED BY REACTIVE MAGNETRON SPUTTERING
    GEORGIEV, G
    FESCHIEV, N
    POPOV, D
    UZUNOV, Z
    VACUUM, 1986, 36 (10) : 595 - 597
  • [27] PREPARATION AND CHARACTERIZATION OF CONDUCTIVE IROX THIN-FILMS BY REACTIVE SPUTTERING
    KAWATE, S
    FUJIWARA, R
    ODA, S
    SHIMIZU, I
    NIPPON KAGAKU KAISHI, 1986, (03) : 249 - 254
  • [28] THE CRYSTAL-STRUCTURE OF EPITAXIALLY GROWN SNO2 THIN-FILMS
    PRODAN, A
    VENE, N
    SEVSEK, F
    HUDOMALJ, M
    THIN SOLID FILMS, 1987, 147 (03) : 313 - 319
  • [29] TITANIUM NITRIDE THIN-FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING
    GEORGIEV, GP
    POPOV, DN
    PLASMA SURFACE ENGINEERING, VOLS 1 AND 2, 1989, : 587 - 594
  • [30] DEPOSITION RATE OF METALLIC THIN-FILMS IN REACTIVE SPUTTERING PROCESS
    ABE, T
    YAMASHINA, T
    THIN SOLID FILMS, 1975, 30 (01) : 19 - 27
12345