YIG ferrite thin-films epitaxially grown by reactive sputtering method

被引:0
|
作者
Yamamoto, Setsuo [1 ]
Kuniki, Hirofumi [1 ]
Kurisu, Hiroki [1 ]
Matsuura, Mitsuru [1 ]
Jang, Pyungwoo [2 ]
机构
[1] Yamaguchi Univ., 2-16-1 Tokiwadai, Ube 755-8611, Japan
[2] Chongju Univ., 36 Naeduck-dong, Sangdang-gu, Cheongju 360-764, Korea, Republic of
关键词
D O I
10.2497/jjspm.51.190
中图分类号
学科分类号
摘要
3
引用
收藏
页码:190 / 194
相关论文
共 50 条
  • [41] STRUCTURAL AND ELECTRICAL CHARACTERISTICS OF INSB THIN-FILMS GROWN BY RF SPUTTERING
    GREENE, JE
    WICKERSHAM, CE
    JOURNAL OF APPLIED PHYSICS, 1976, 47 (08) : 3630 - 3639
  • [42] STRESSES IN EPITAXIALLY GROWN SINGLE-CRYSTAL FILMS - YIG ON YAG
    ZEYFANG, R
    JOURNAL OF APPLIED PHYSICS, 1970, 41 (09) : 3718 - +
  • [43] PREPARATION OF THIN-FILMS BY SPUTTERING
    REICHELT, K
    VAKUUM-TECHNIK, 1975, 24 (01): : 1 - 11
  • [44] ON THE PROPERTIES OF A1N THIN-FILMS GROWN BY LOW-TEMPERATURE REACTIVE RF-SPUTTERING
    LI, XJ
    XU, ZH
    HE, ZY
    CAO, HZ
    SU, WD
    CHEN, ZC
    ZHOU, F
    WANG, EU
    THIN SOLID FILMS, 1986, 139 (03) : 261 - 274
  • [45] Electrical and optical properties of zinc oxide thin films grown by reactive magnetron sputtering method
    Abdullin, KA
    Aimagambetov, AB
    Beisenkhanov, NB
    Issova, AT
    Mukashev, BN
    Tokmoldin, SZ
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2004, 109 (1-3): : 241 - 244
  • [46] INFLUENCE OF THE PUMPING SPEED ON THE HYSTERESIS EFFECT IN THE REACTIVE SPUTTERING OF THIN-FILMS
    KADLEC, S
    MUSIL, J
    VYSKOCIL, J
    VACUUM, 1987, 37 (10) : 729 - 738
  • [47] GROWTH AND CHARACTERIZATION OF TIN OXIDE THIN-FILMS PREPARED BY REACTIVE SPUTTERING
    DIGIULIO, M
    MANNO, D
    MICOCCI, G
    RELLA, R
    SICILIANO, P
    TEPORE, A
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1993, 31 (02) : 235 - 242
  • [48] A STUDY OF HETEROGENEOUS NIOBIUM CARBONITRIDE THIN-FILMS DEPOSITED BY REACTIVE SPUTTERING
    AUBERT, A
    SPITZ, J
    THIN SOLID FILMS, 1982, 96 (03) : 191 - 198
  • [49] FERROELECTRIC THIN-FILMS BY REACTIVE SPUTTERING AND HIGH-TEMPERATURE CONVERSION
    VOGEL, SF
    BARLOW, IC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (02): : 381 - 385
  • [50] INSITU YBA2CU3O7-X THIN-FILMS EPITAXIALLY GROWN BY SINGLE TARGET DC SPUTTERING
    GUILLOUXVIRY, M
    KARKUT, MG
    PERRIN, A
    PENA, O
    PADIOU, J
    SERGENT, M
    PHYSICA C, 1990, 166 (1-2): : 105 - 110