TITANIUM NITRIDE THIN-FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING

被引：0
|
作者：
GEORGIEV, GP
POPOV, DN
机构：
来源：
PLASMA SURFACE ENGINEERING, VOLS 1 AND 2 | 1989年
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D O I：
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中图分类号：
T [工业技术];
学科分类号：
08 ;
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页码：587 / 594
页数：8
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