Application of Ion Implantation to the Manufacture of Semiconductor Devices.

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Saczuk, Krzysztof

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| 1600年 / 13期

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摘要：

SEMICONDUCTOR DEVICE MANUFACTURE

引用

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[1] USE OF BF2 + IMPLANTATION IN THE PRODUCTION OF SEMICONDUCTOR DEVICES.
Chernyaev, A.V.
Chernetskii, T.P.
Soviet Microelectronics (English Translation of Mikroelektronika), 1979, 8 (06): : 377 - 380
[2] APPLICATION OF ION-IMPLANTATION TO THE FABRICATION OF COMPOUND SEMICONDUCTOR-DEVICES
EISEN, FH
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (08) : C327 - C327
[3] ION IMPLANTATION EQUIPMENT AND PROCESSES FOR SEMICONDUCTOR DEVICE MANUFACTURE
MACDOUGALL, JD
SOLID STATE TECHNOLOGY, 1971, 14 (10) : 46 - +
[4] ION-IMPLANTATION FOR SEMICONDUCTOR-DEVICES
DUCHYNSKI, RJ
SOLID STATE TECHNOLOGY, 1977, 20 (11) : 53 - 58
[5] ION-IMPLANTATION FOR SEMICONDUCTOR-DEVICES
DUCHYNSKI, RJ
WESTERN ELECTRIC ENGINEER, 1977, 21 (02): : 59 - 66
[6] SOLDER TERMINAL FOR SEMICONDUCTOR DEVICES.
IBM technical disclosure bulletin, 1985, 27 (09):
[7] Measurements of Noise in Semiconductor Devices.
Spiralski, Ludwik
Elektronika Warszawa, 1980, 21 (11): : 15 - 22
[8] FABRICATION OF POWER SEMICONDUCTOR DEVICES.
Tuchkevich, V.M.
Tepman, I.A.
Kovalev, F.I.
Yakivchik, N.I.
Soviet electrical engineering, 1980, 51 (01): : 67 - 75
[9] IDEAS ON MAGNETIC SEMICONDUCTOR DEVICES.
HOPPER, CHARLES
1982, V 15 (N 20):
[10] Design and manufacture of polymer planar waveguide devices.
Kenney, JT
Lam, JC
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1998, 216 : U146 - U146