APPLICATION OF ION-IMPLANTATION TO THE FABRICATION OF COMPOUND SEMICONDUCTOR-DEVICES

被引：0

|

作者：

EISEN, FH ^{[1
]}

机构：

[1] ROCKWELL INT CORP,MICROELECTR RES & DEV CTR,THOUSAND OAKS,CA 91360

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 08期

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D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：C327 / C327

页数：1

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