Growth rate measurement of lateral grains in silicon film during excimer laser annealing

被引：0

作者：

Yeh, Wenchang ^{[1
]}

Zhuang, Chun-Jun ^{[1
]}

Ke, Dunyuan ^{[1
]}

机构：

[1] Department of Electronic Engineering, National Taiwan University of Science and Technology, No. 43, Keelung Road, Taipei 106, Taiwan

来源：

Japanese Journal of Applied Physics, Part 2: Letters | 2007年 / 46卷 / 25-28期

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D O I：

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学科分类号：

摘要：

Journal article (JA)

引用

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