Growth rate measurement of lateral grains in silicon film during excimer laser annealing

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作者：
Yeh, Wenchang [1 ]
Zhuang, Chun-Jun [1 ]
Ke, Dunyuan [1 ]
机构：
[1] Department of Electronic Engineering, National Taiwan University of Science and Technology, No. 43, Keelung Road, Taipei 106, Taiwan
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 2007年 / 46卷 / 25-28期
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