Fabrication and characteristics of double-gate zinc oxide nanowire field emitter arrays

被引:0
|
作者
Ou, Zhuoran [1 ]
Wang, Chengyun [1 ]
Zhang, Guofu [1 ]
Li, Xinran [1 ]
Ou, Hai [1 ]
Deng, Shaozhi [1 ]
Xu, Ningsheng [1 ]
She, Juncong [1 ]
Chen, Jun [1 ]
机构
[1] Sun Yat Sen Univ, Sch Elect & Informat Technol, Guangdong Prov Key Lab Display Mat & Technol, State Key Lab Optoelect Mat & Technol, Guangzhou, Peoples R China
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2024年 / 42卷 / 06期
基金
中国国家自然科学基金;
关键词
LARGE-AREA; ZNO NANOWIRES; EMISSION; TIPS;
D O I
10.1116/6.0004043
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Large area addressable zinc oxide (ZnO) nanowire field emitter arrays (FEAs) have important applications in vacuum microelectronic devices such as flat panel x-ray sources. However, further work on increasing the performance of gated ZnO nanowire FEAs is needed. In this work, we propose double-gate ZnO nanowire FEAs. Simulation results show that the double-gate structure can realize higher gate modulation capability compared with the single-gate structure. Double-gate ZnO nanowire FEAs have been fabricated, and their performance has been studied. The maximum emission current density (3.32 mA/cm(2)) and transconductance (2433 nS) obtained in this work are higher than the previously reported ZnO nanowire FEAs. The results verify that double-gate ZnO nanowire FEAs are promising for applications in large area vacuum microelectronic devices.
引用
收藏
页数:9
相关论文
共 50 条
  • [41] Novel process for vertical double-gate (DG) metal-oxide-semiconductor field-effect-transistor (MOSFET) fabrication
    Masahara, M
    Matsukawa, T
    Tanoue, H
    Ishii, K
    Liu, YX
    Sakamoto, K
    Kanemaru, S
    Suzuki, E
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (6B): : 4138 - 4141
  • [42] Novel process for vertical double-gate (DG) metal-oxide-semiconductor field-effect-transistor (MOSFET) fabrication
    Masahara, M. (m.masahara@aist.go.jp), 1600, Japan Society of Applied Physics (42):
  • [43] A NOVEL FABRICATION PROCESS OF A SILICON FIELD EMITTER ARRAY WITH THERMAL OXIDE AS A GATE INSULATOR
    UH, HS
    KWON, SJ
    LEE, JD
    IEEE ELECTRON DEVICE LETTERS, 1995, 16 (11) : 488 - 490
  • [44] Double-Gate Vectorial Frequency Control in Piezoresistive Nanowire Electromechanical Devices
    Tomita, Wataru
    Sasaki, Satoshi
    Asano, Motoki
    Tateno, Kouta
    Okamoto, Hajime
    Yamaguchi, Hiroshi
    PHYSICAL REVIEW APPLIED, 2022, 17 (04)
  • [45] Numerical and experimental characterization of single- and double-gate race-track-shaped field emitter structures
    Wang, BP
    Sin, JKO
    Cai, J
    Poon, VMC
    Wang, C
    Tang, YM
    Tong, LS
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1998, 45 (02) : 554 - 559
  • [46] Measurement of transverse emittance and coherence of double-gate field emitter array cathodes (vol 7, 13976, 2016)
    Tsujino, Soichiro
    Das Kanungo, Prat
    Monshipouri, Mahta
    Lee, Chiwon
    Miller, R. J. Dwayne
    NATURE COMMUNICATIONS, 2017, 8 : 14526
  • [47] Addressable field emitter arrays with high density patterned ZnO nanowire emitters and under-gate structure
    Wang, Xuqi
    Wang, Libin
    Bai, Xinpeng
    She, Juncong
    Deng, Shaozhi
    Chen, Jun
    2020 33RD INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE (IVNC), 2018, : 100 - 101
  • [48] Realization with fabrication of double-gate MOSFET based boost regulator
    Khumalo, Sipho
    Srivastava, Viranjay M.
    MATERIALS TODAY-PROCEEDINGS, 2022, 59 : 827 - 834
  • [49] Realization with fabrication of double-gate MOSFET based differential amplifier
    Pakaree, Japheth E.
    Srivastava, Viranjay M.
    MICROELECTRONICS JOURNAL, 2019, 91 : 70 - 83
  • [50] Oscillation of gate leakage current in double-gate metal-oxide-semiconductor field-effect transistors
    Do, V. Nam
    Dollfus, P.
    JOURNAL OF APPLIED PHYSICS, 2007, 101 (07)