Structure and physical properties of Si-based BiFe0.95Mn0.05O3 ferroelectric capacitor using Ni-Al as the barrier layer

被引：0
|
作者：
Chen, Jian-Hui [1 ]
Liu, Bao-Ting [1 ]
Wei, Da-Yong [1 ]
Wang, Kuan-Mao [1 ]
Cui, Yong-Liang [1 ]
Wang, Ying-Long [1 ]
Zhao, Qing-Xun [1 ]
Wei, Meng-Yi [1 ]
机构：
[1] College of Physics Science and Technology, Heibei University, Baoding 071002, China
来源：
Rengong Jingti Xuebao/Journal of Synthetic Crystals | 2011年 / 40卷 / 01期
关键词：
Amorphous silicon - Amorphous films - Ferroelectricity - Ruthenium compounds;
D O I：
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学科分类号：
摘要：
SrRuO3 (SRO)/BiFe0.95Mn0.05O3(BFMO)/SRO heterostructure capacitors were fabricated on Si substrates using Ni-Al as the barrier layer between Si and SRO. X-ray diffraction (XRD) reveals that the Ni-Al barrier is amorphous, while well-crytallinized BFMO film is polycrystalline. A good saturated hysteresis loop coude be obtained from the SRO/BFMO/SRO ferroelectric capacitor at 5 kHz. The experiment results show that BFMO capacitor possesses very good fatigue-resistance. The leakage mechanism of the SRO/BFMO/SRO ferroelectric capacitor was studied. SRO/BFMO/SRO capacitor satisfied the ohmic conduction behavior at applied fields lower than 210 kV/cm and bulk-limited space-charge-limited conduction (SCLC) at the applied fields higher than 210 kV/cm.
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页码：33 / 37
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