New trap-assisted band-to-band tunneling induced gate current model for p-channel metal-oxide-semiconductor field effect transistors with sub-3 nm oxides

被引:0
|
作者
Lee, H.-M. [1 ]
Liu, C.-J. [1 ]
Hsu, C.-W. [1 ]
Liang, M.-S. [1 ]
King, Y.-C. [1 ]
Hsu, C.C.-H. [1 ]
机构
[1] Microelectronics Laboratory, Department of Electrical Engineering, National Tsing-Hua University, Hsin-Chu 300, Taiwan
关键词
D O I
10.1143/jjap.40.1218
中图分类号
学科分类号
摘要
5
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页码:1218 / 1221
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