Stabilization of ZrSixOy films by irradiation with an ArF excimer laser

被引：0
|
作者：
Nakazawa, Keisuke [1 ,2 ]
Matsuo, Takahiro [1 ]
Onodera, Toshio [1 ]
Ogawa, Tohru [1 ,3 ]
Morimoto, Hiroaki [1 ]
机构：
[1] Semiconduct. Leading Edge T., 292 Yoshida-cho, Yokohama, Kanagawa 244-0817, Japan
[2] Proc. and Mfg. Engineering Center, Toshiba Co. Semicoundactor Company, 8 Shinsugita-cho, Yokohama, Kanagawa 235-8522, Japan
[3] Technology Strategy Development, Sony Co. Core Technol. Netwk. Co., 4-14-1 Asahi-cho, Atsugi-shi, Kanagawa 243-0014, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2000年 / 39卷 / 7 B期
关键词：
Compendex;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Chemical bonds - Excimer lasers - Lithography - Masks - Molecular structure - Oxidation - Phase shift - Photochemical reactions - Zirconium compounds
引用
收藏
页码：4561 / 4566
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