Stabilization of ZrSixOy films by irradiation with an ArF excimer laser

被引：0

作者：

Nakazawa, Keisuke ^{[1
,2
]}

Matsuo, Takahiro ^{[1
]}

Onodera, Toshio ^{[1
]}

Ogawa, Tohru ^{[1
,3
]}

Morimoto, Hiroaki ^{[1
]}

机构：

[1] Semiconduct. Leading Edge T., 292 Yoshida-cho, Yokohama, Kanagawa 244-0817, Japan

[2] Proc. and Mfg. Engineering Center, Toshiba Co. Semicoundactor Company, 8 Shinsugita-cho, Yokohama, Kanagawa 235-8522, Japan

[3] Technology Strategy Development, Sony Co. Core Technol. Netwk. Co., 4-14-1 Asahi-cho, Atsugi-shi, Kanagawa 243-0014, Japan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2000年 / 39卷 / 7 B期

关键词：

Compendex;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Chemical bonds - Excimer lasers - Lithography - Masks - Molecular structure - Oxidation - Phase shift - Photochemical reactions - Zirconium compounds

引用

页码：4561 / 4566

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