Dynamics of the hydrodynamical growth of columns on silicon exposed to ArF excimer-laser irradiation

被引：0
|
作者：
F. Sánchez
J.L. Morenza
R. Aguiar
J.C. Delgado
M. Varela
机构：
[1] Universitat de Barcelona,
[2] Departament de Física Aplicada i Electrònica,undefined
[3] Avda. Diagonal 647,undefined
[4] E-08028 Barcelona,undefined
[5] Spain (Fax: +34-3/402-1138,undefined
[6] E-mail: fsanchez@electra.fae.ub.es),undefined
来源：
Applied Physics A | 1998年 / 66卷
关键词：
PACS: 81.40 Z; 81.60 Z; 68.70;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：83 / 86
页数：3
相关论文
共 50 条
  • [1] Dynamics of the hydrodynamical growth of columns on silicon exposed to ArF excimer-laser irradiation
    Sanchez, F
    Morenza, JL
    Aguiar, R
    Delgado, JC
    Varela, M
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1998, 66 (01): : 83 - 86
  • [2] Whiskerlike structure growth on silicon exposed to ArF: Excimer laser irradiation
    Sanchez, F
    Morenza, JL
    Aguiar, R
    Delgado, JC
    Varela, M
    APPLIED PHYSICS LETTERS, 1996, 69 (05) : 620 - 622
  • [3] Characterization of the progressive growth of columns by excimer laser irradiation of silicon
    Sánchez, F
    Morenza, JL
    Trtik, V
    APPLIED PHYSICS LETTERS, 1999, 75 (21) : 3303 - 3305
  • [4] TUNABLE ARF EXCIMER-LASER SOURCE
    WHITE, JC
    BOKOR, J
    FREEMAN, RR
    HENDERSON, D
    OPTICS LETTERS, 1981, 6 (06) : 293 - 294
  • [5] EXCIMER-LASER ETCHING ON SILICON
    HORIIKE, Y
    HAYASAKA, N
    SEKINE, M
    ARIKADO, T
    NAKASE, M
    OKANO, H
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1987, 44 (04): : 313 - 322
  • [6] Modification of silicon nitride films to oxynitrides by ArF excimer laser irradiation
    Serra, J
    Parada, EG
    Gonzalez, P
    Fernandez, D
    Chiussi, S
    Pou, J
    Leon, B
    PerezAmor, M
    SURFACE & COATINGS TECHNOLOGY, 1996, 80 (1-2): : 211 - 215
  • [7] Stress generated in polyimide by excimer-laser irradiation
    Zweig, A.D.
    Venugopalan, V.
    Deutsch, T.F.
    Journal of Applied Physics, 1993, 74 (06): : 4181 - 4189
  • [8] Surface micro-structuring of silicon by excimer-laser irradiation in reactive atmospheres
    Pedraza, AJ
    Fowlkes, JD
    Jesse, S
    Mao, C
    Lowndes, DH
    APPLIED SURFACE SCIENCE, 2000, 168 (1-4) : 251 - 257
  • [9] Stress generated in polymide by excimer-laser irradiation
    1600, American Inst of Physics, Woodbury, NY, USA (74):
  • [10] NEW KRF AND ARF EXCIMER-LASER FOR ADVANCED DUV LITHOGRAPHY
    ENDERT, H
    PATZEL, R
    POWELL, M
    REBHAN, U
    BASTING, D
    MICROELECTRONIC ENGINEERING, 1995, 27 (1-4) : 221 - 224
12345