Research Progress of Flexible Hard Coating Deposited by Deep Oscillating Magnetron Sputtering

被引：0
|
作者：
Wang, Haoqi [1 ,2 ]
Zhou, Qian [1 ]
Sun, Li [1 ]
Ou, Yixiang [1 ,2 ,3 ]
Jin, Xiaoyue [2 ]
Zhang, Xu [1 ]
Hua, Qingsong [1 ]
Pang, Pan [2 ]
Luo, Jun [2 ]
Chen, Lin [2 ]
Liao, Bin [1 ]
Ouyang, Xiaoping [4 ]
Bao, Manyu [5 ]
机构：
[1] Key Laboratory of Ray Beam Technology, Ministry of Education, Institute of Nuclear Science and Technology, Beijing Normal University, Beijing,100875, China
[2] Beijing Radiation Center, Beijing,100875, China
[3] Changzhi Medical College, Changzhi,046000, China
[4] Institute of Northwest Nuclear Physics, Xi'an,710024, China
[5] Beijing Jinlunkuntian Special Machine Co., Ltd, Beijing,100083, China
来源：
Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering | 2021年 / 50卷 / 08期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：2993 / 3002
相关论文
共 50 条
  • [31] COATING CHARACTERIZATION IN CrN DEPOSITED BY MAGNETRON SPUTTERING METHOD ON AISI 316 STEEL
    Hilerio, I.
    Vite, M.
    Moreno, M.
    Barron, M. A.
    Jimenez, H.
    Vazquez, B.
    IMECE 2008: PROCEEDINGS OF THE ASME INTERNATIONAL MECHANICAL ENGINEERING CONGRESS AND EXPOSITION, VOL 7, 2009, : 129 - 133
  • [32] Hard coatings deposited by combined cathodic arc evaporation and magnetron sputtering (Arc Bond Sputtering: ABS)
    Münz, W.D.
    Schönjahn, C.
    Paritong, H.
    Smith, I.J.
    Vide: Science, Technique et Applications, 2000, 3
  • [33] Hard coatings deposited by combined cathodic arc evaporation and magnetron sputtering (arc bond sputtering : ABS)
    Münz, WD
    Schönjahn, C
    Paritong, H
    Smith, IJ
    VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 2000, 55 (297): : 205 - 223
  • [34] Influence of Target Current on Structure and Performance of Cu Films Deposited by Oscillating Pulse Magnetron Sputtering
    Wang, Rong
    Yang, Chao
    Hao, Juan
    Shi, Jing
    Yan, Fangyuan
    Zhang, Nan
    Jiang, Bailing
    Shao, Wenting
    COATINGS, 2022, 12 (03)
  • [35] Research on CrN-based Ternary Films Deposited by magnetron sputtering
    Di, Yuelan
    Cai, Zhihai
    Zhang, Ping
    Shen, Wei
    ADVANCED MATERIALS AND PROCESSES II, PTS 1-3, 2012, 557-559 : 1650 - 1653
  • [36] Characterization of the mechanical properties and failure modes of hard coatings deposited by RF magnetron sputtering
    Luo, Fei
    Gao, Kewei
    Pang, Xiaolu
    Yang, Huisheng
    Qiao, Lijie
    Wang, Yanbin
    SURFACE & COATINGS TECHNOLOGY, 2008, 202 (14): : 3354 - 3359
  • [37] Study of thermal stability of some hard nitride coatings deposited by reactive magnetron sputtering
    Héau, C
    Fillit, RY
    Vaux, F
    Pascaretti, F
    SURFACE & COATINGS TECHNOLOGY, 1999, 120 : 200 - 205
  • [38] Characterization of ultra-hard silicon carbide coatings deposited by RF magnetron sputtering
    Costa, AK
    Camargo, SS
    Achete, CA
    Carius, R
    THIN SOLID FILMS, 2000, 377 : 243 - 248
  • [39] Properties of nano-multilayered hard coatings deposited by a new hybrid coating process: Combined cathodic arc and unbalanced magnetron sputtering
    Yamamoto, K
    Kujime, S
    Takahara, K
    SURFACE & COATINGS TECHNOLOGY, 2005, 200 (1-4): : 435 - 439
  • [40] C/CrC nanocomposite coating deposited by magnetron sputtering at high ion irradiation conditions
    Zhou, Z.
    Rainforth, W. M.
    Gass, M. H.
    Bleloch, A.
    Ehiassarian, A. P.
    Hovsepian, P. Eh.
    JOURNAL OF APPLIED PHYSICS, 2011, 110 (07)
12345