THERMAL WARPAGE OF LARGE DIAMETER CZOCHRALSKI-GROWN SILICON-WAFERS

被引：19
|
作者：
SHIMIZU, H [1 ]
AOSHIMA, T [1 ]
机构：
[1] HITACHI LTD, MUSASHI WORKS, KODAIRA, TOKYO 187, JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1988年 / 27卷 / 12期
关键词：
D O I：
10.1143/JJAP.27.2315
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：2315 / 2323
页数：9
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