ANALYSIS OF BURIED NITRIDE LAYERS PRODUCED BY ION-IMPLANTATION

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作者：
FROSE, D
KOLLEWE, D
机构：
来源：
SILICON NITRIDE 93 | 1994年 / 89-9卷
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暂无
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
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页码：749 / 749
页数：1
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