THE FORMATION OF BURIED OXIDE LAYERS BY ION-IMPLANTATION

被引：1
|
作者：
WOODS, TA [1 ]
ANTONELLI, E [1 ]
COLLINS, RA [1 ]
CHIVERS, DJ [1 ]
DEARNALEY, G [1 ]
机构：
[1] AERE,HARWELL OX11 0RA,OXON,ENGLAND
来源：
VACUUM | 1986年 / 36卷 / 11-12期
关键词：
D O I：
10.1016/0042-207X(86)90132-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：883 / 885
页数：3
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