USE OF ASYMMETRIC EXPOSURES IN PLANAR WAVE X-RAY TOPOGRAPHY FOR THE STUDY OF MICRODEFECTS IN SILICON-CRYSTALS

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VOLOSHIN, AE
SMOLSKII, IL
ROZHANSKII, VN
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ZHURNAL TEKHNICHESKOI FIZIKI | 1992年 / 62卷 / 04期
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O59 [应用物理学];
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页码：171 / 175
页数：5
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