X-RAY TOPOGRAPHY STUDY OF MICRODEFECTS IN SILICON

被引：0
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作者：
KRYLOVA, NO
MELING, V
SHULPINA, IL
SHEIKHET, EG
机构：
来源：
FIZIKA TVERDOGO TELA | 1986年 / 28卷 / 02期
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中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
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页码：440 / 446
页数：7
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