MOLECULAR-BEAM EPITAXIAL-GROWTH OF HIGH-QUALITY ZN1-XCDXSE ON INP SUBSTRATES

被引:27
|
作者
DAI, N
CAVUS, A
DZAKPASU, R
TAMARGO, MC
SEMENDY, F
BAMBHA, N
HWANG, DM
CHEN, CY
机构
[1] USA,RES LAB,FT BELVOIR,VA 22060
[2] BELLCORE,RED BANK,NJ 07701
关键词
D O I
10.1063/1.113694
中图分类号
O59 [应用物理学];
学科分类号
摘要
High quality, lattice matched Zn1-xCdxSe has been grown on InP substrates by molecular beam epitaxy. The quality of the epilayers was monitored by reflection high energy electron diffraction, and by low temperature photoluminescence and transmission electron microscopy (TEM). The use of an As flux during the pregrowth substrate treatment followed by a low initial growth temperature were needed to optimize the growth. TEM images of samples grown under these conditions show abrupt interfaces and good crystalline quality. Epilayers exhibit excellent optical properties, indicated by a very narrow, high intensity near-band-edge excitonic emission peak (full width at half maximum of 10 meV), and almost negligible deep level emission.© 1995 American Institute of Physics.
引用
收藏
页码:2742 / 2744
页数:3
相关论文
共 50 条
  • [31] MOLECULAR-BEAM EPITAXIAL-GROWTH AND INTERFACE CHARACTERISTICS OF GAASSB ON GAAS SUBSTRATES
    YANO, M
    ASHIDA, M
    KAWAGUCHI, A
    IWAI, Y
    INOUE, M
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (02): : 199 - 203
  • [32] Infrared lattice-reflection spectroscopy of Zn1-xCdxSe epitaxial layers grown on a GaAs substrate by molecular-beam epitaxy
    Vodop'yanov, LK
    Kozyrev, SP
    Sadof'ev, YG
    [J]. PHYSICS OF THE SOLID STATE, 1999, 41 (06) : 893 - 896
  • [33] MOLECULAR-BEAM EPITAXIAL-GROWTH OF CDTE(112) ON SI(112) SUBSTRATES
    DELYON, TJ
    RAJAVEL, D
    JOHNSON, SM
    COCKRUM, CA
    [J]. APPLIED PHYSICS LETTERS, 1995, 66 (16) : 2119 - 2121
  • [34] EPITAXIAL-GROWTH OF II-V SEMICONDUCTING COMPOUND ZN3AS2 ON GAAS AND INP SUBSTRATES BY MOLECULAR-BEAM EPITAXY
    CHELLURI, B
    CHANG, TY
    OURMAZD, A
    DAYEM, A
    SAUER, NJ
    ZYSKIND, JL
    SULHOFF, JW
    [J]. JOURNAL OF ELECTRONIC MATERIALS, 1986, 15 (05) : 314 - 314
  • [35] MOLECULAR-BEAM EPITAXIAL-GROWTH OF HIGH-QUALITY GAAS ON SI USING A HIGH-TEMPERATURE INSITU ANNEALING PROCESS
    KAO, YC
    LIU, HY
    TSAI, HL
    DUNCAN, WM
    KIM, TS
    SHICHIJO, H
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (02): : 250 - 253
  • [36] HIGH-QUALITY INP GROWN BY MOLECULAR-BEAM EPITAXY
    TSANG, WT
    MILLER, RC
    CAPASSO, F
    BONNER, WA
    [J]. APPLIED PHYSICS LETTERS, 1982, 41 (05) : 467 - 469
  • [37] MOLECULAR-BEAM EPITAXY OF CUBIC ZN1-XCDXSE AND CD1-XMNXSE AND RELATED SUPERLATTICES
    SAMARTH, N
    LUO, H
    FURDYNA, JK
    QADRI, SB
    LEE, YR
    ALONSO, RG
    SUH, EK
    RAMDAS, AK
    OTSUKA, N
    [J]. SURFACE SCIENCE, 1990, 228 (1-3) : 226 - 229
  • [38] MOLECULAR-BEAM EPITAXY OF CDSE AND THE DERIVATIVE ALLOYS ZN1-XCDXSE AND CD1-XMNXSE
    SAMARTH, N
    LUO, H
    FURDYNA, JK
    QADRI, SB
    LEE, YR
    RAMDAS, AK
    OTSUKA, N
    [J]. JOURNAL OF ELECTRONIC MATERIALS, 1990, 19 (06) : 543 - 547
  • [39] MOLECULAR-BEAM EPITAXIAL-GROWTH OF HIGH-PURITY ALGAAS
    CUNNINGHAM, JE
    TSANG, WT
    CHIU, TH
    SCHUBERT, EF
    [J]. APPLIED PHYSICS LETTERS, 1987, 50 (12) : 769 - 771
  • [40] MOLECULAR-BEAM EPITAXIAL-GROWTH OF HIGH-PURITY GAAS
    MCCOLLUM, MJ
    SZAFRANEK, I
    PLANO, MA
    JACKSON, SL
    STOCKMAN, SA
    STILLMAN, GE
    [J]. JOURNAL OF ELECTRONIC MATERIALS, 1990, 19 (07) : 14 - 15