MOLECULAR-BEAM EPITAXIAL-GROWTH OF GAAS ON SILICON WITH BURIED IMPLANTED OXIDES

被引:2
|
作者
DAS, K
HUMPHREYS, TP
WORTMAN, JJ
POSTHILL, JB
TARN, JCL
PARIKH, N
机构
[1] N CAROLINA STATE UNIV,DEPT MAT SCI & ENGN,RALEIGH,NC 27695
[2] UNIV N CAROLINA,DEPT PHYS & ASTRON,CHAPEL HILL,NC 27514
关键词
D O I
10.1049/el:19880045
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:67 / 68
页数:2
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