MOLECULAR-BEAM EPITAXIAL-GROWTH ON RADIATION-HEATED GAAS SUBSTRATES

被引:0
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作者
PALMATEER, SC [1 ]
LEE, BR [1 ]
HWANG, JCM [1 ]
机构
[1] GE,ELECTR LAB,SYRACUSE,NY 13221
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中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:C467 / C467
页数:1
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