METAL-CONTAINING FLUOROPOLYMER FILMS PRODUCED BY SIMULTANEOUS PLASMA-ETCHING AND POLYMERIZATION - EFFECTS OF HYDROGEN OR OXYGEN

被引:34
|
作者
KAY, E
DILKS, A
SEYBOLD, D
机构
[1] UNIV DURHAM,DEPT CHEM,DURHAM DH1 3LE,ENGLAND
[2] IBM GERMANY LTD,D-7032 SINDELFINGEN,FED REP GER
关键词
D O I
10.1063/1.327491
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:5678 / 5687
页数:10
相关论文
共 50 条
  • [41] ADVERSE-EFFECTS ON PLASMA-POLYMERIZED FILMS DUE TO PREVIOUS OXYGEN ETCHING IN AN ELECTRODELESS REACTOR
    WYMORE, T
    NICHOLS, MF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (03): : 677 - 680
  • [42] EFFECTS OF CF4 PLASMA-ETCHING OF SIO2 ON THE PROPERTIES OF MOS STRUCTURES FORMED ON THE REMAINING SIO2-FILMS
    TOKUDA, Y
    YAMANE, H
    USAMI, A
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1985, 18 (01) : L1 - L4
  • [43] Effects of oxygen exposure on plasma graft polymerization of some hydrophilic monomers onto polypropylene films
    Hirotsu, T
    JOURNAL OF MACROMOLECULAR SCIENCE-PURE AND APPLIED CHEMISTRY, 1996, A33 (11): : 1663 - 1674
  • [44] Hydrogen-containing carbon nitride films produced by the combined hot filament-plasma CVD technique
    Wang, JJ
    de Moraes, MAB
    Baranauskas, V
    Durrant, SF
    THIN SOLID FILMS, 2000, 377 : 280 - 284
  • [45] ION-BEAM TECHNIQUES COMBINING INSULATOR DEPOSITION AND HYDROGEN PLASMA-ETCHING FOR III-V-COMPOUND METAL-INSULATOR SEMICONDUCTOR-DEVICE APPLICATIONS
    SIBRAN, C
    BLANCHET, R
    GARRIGUES, M
    VIKTOROVITCH, P
    THIN SOLID FILMS, 1983, 103 (1-2) : 211 - 219
  • [46] Enhanced mechanical properties of low-surface energy thin films by simultaneous plasma polymerization of fluorine and epoxy containing polymers
    Karaman, Mustafa
    Ucar, Tuba
    APPLIED SURFACE SCIENCE, 2016, 362 : 210 - 216
  • [47] Damage recovery and low-damage etching of ITO in H2/CO plasma: Effects of hydrogen or oxygen
    Hirata, Akiko
    Fukasawa, Masanaga
    Kugimiya, Katsuhisa
    Karahashi, Kazuhiro
    Hamaguchi, Satoshi
    Nagaoka, Kojiro
    PLASMA PROCESSES AND POLYMERS, 2019, 16 (09)
  • [48] Impact of high microwave power on hydrogen impurity trapping in nanocrystalline diamond films grown with simultaneous nitrogen and oxygen addition into methane/hydrogen plasma
    Tang, C. J.
    Fernandes, A. J. S.
    Jiang, X. F.
    Pinto, J. L.
    Ye, H.
    JOURNAL OF CRYSTAL GROWTH, 2016, 434 : 36 - 41
  • [49] Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF4/H2 plasma at different substrate temperatures
    Hsiao, Shih-Nan
    Britun, Nikolay
    Thi-Thuy-Nga Nguyen
    Tsutsumi, Takayoshi
    Ishikawa, Kenji
    Sekine, Makoto
    Hori, Masaru
    PLASMA PROCESSES AND POLYMERS, 2021, 18 (11)
  • [50] Preparation and oxygen binding properties of ultra-thin polymer films containing cobalt(II) meso-tetraphenylporphyrin via plasma polymerization
    Choe, Y
    MACROMOLECULAR RESEARCH, 2002, 10 (05) : 273 - 277