METAL-CONTAINING FLUOROPOLYMER FILMS PRODUCED BY SIMULTANEOUS PLASMA-ETCHING AND POLYMERIZATION - EFFECTS OF HYDROGEN OR OXYGEN

被引：34
|
作者：
KAY, E
DILKS, A
SEYBOLD, D
机构：
[1] UNIV DURHAM,DEPT CHEM,DURHAM DH1 3LE,ENGLAND
[2] IBM GERMANY LTD,D-7032 SINDELFINGEN,FED REP GER
来源：
JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 11期
关键词：
D O I：
10.1063/1.327491
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：5678 / 5687
页数：10
相关论文
共 50 条
  • [21] METAL CONTAINING PLASMA POLYMERIZED FLUOROCARBON FILMS - THEIR SYNTHESIS, STRUCTURE AND POLYMERIZATION MECHANISM
    KAY, E
    DILKS, A
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1978, 176 (SEP): : 114 - 114
  • [22] Additive oxygen effects in Cl2 plasma etching of chrome films
    Kwon, KH
    Kang, SY
    Park, SH
    Sung, HK
    Kim, DK
    Moon, JH
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1999, 18 (15) : 1197 - 1200
  • [23] INSITU PROCESS EVALUATION DURING HYDROGEN PLASMA-ETCHING OF A-SI-H FILMS BY MICROWAVE DETECTED TRANSIENT PHOTOCONDUCTIVITY MEASUREMENTS
    NEITZERT, HC
    HIRSCH, W
    KUNST, M
    JOURNAL OF APPLIED PHYSICS, 1993, 73 (11) : 7446 - 7452
  • [24] Oxygen, hydrogen, and deuterium effects on plasma nitriding of metal alloys
    Figueroa, CA
    Weber, S
    Czerwiec, T
    Alvarez, F
    SCRIPTA MATERIALIA, 2006, 54 (07) : 1335 - 1338
  • [25] FRACTAL PATTERN-FORMATION OF METAL-CONTAINING POLYMERIC THIN-FILMS PREPARED BY PLASMA REACTION
    GONG, J
    KAGAMI, Y
    YAMADA, K
    OSADA, Y
    BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN, 1990, 63 (06) : 1578 - 1583
  • [26] Reducing wrinkles and cracks of metal films on PDMS substrate by hexane extraction and oxygen plasma etching
    Meng, Ying
    Li, Zhen Bo
    Chen, Xiang
    Chen, Jia Pin
    MICROELECTRONIC ENGINEERING, 2014, 130 : 8 - 12
  • [27] METAL DOPED POLYMER-FILMS PREPARED BY SIMULTANEOUS PLASMA POLYMERIZATION OF TETRAFLUOROMETHANE AND EVAPORATION OF GOLD
    MARTINU, L
    BIEDERMAN, H
    ZEMEK, J
    VACUUM, 1985, 35 (4-5) : 171 - 176
  • [28] METAL DOPED POLYMER FILMS PREPARED BY SIMULTANEOUS PLASMA POLYMERIZATION OF TETRAFLUOROMETHANE AND EVAPORATION OF GOLD.
    Martinu, L.
    Biederman, H.
    Zemek, J.
    1600, (35): : 4 - 5
  • [29] Preparation and properties of metal-containing diamond-like carbon films by magnetron plasma source ion implantation
    Baba, K
    Hatada, R
    SURFACE & COATINGS TECHNOLOGY, 2005, 196 (1-3): : 207 - 210
  • [30] Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma
    Bruce, R. L.
    Lin, T.
    Phaneuf, R. J.
    Oehrlein, G. S.
    Bell, W.
    Long, B.
    Willson, C. G.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2010, 28 (04): : 751 - 757
12345