TISI2 POLYCRYSTALLINE SILICON - ARSENIC DISTRIBUTION AND SI GRAIN-GROWTH

被引：6

|

作者：

ZHENG, LR

HUNG, LS

PHILLIPS, JR

MAYER, JW

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 11期

关键词：

D O I：

10.1063/1.339080

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：4426 / 4432

页数：7

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