共 50 条
- [1] MODELING OF AGGLOMERATION IN POLYCRYSTALLINE THIN-FILMS - APPLICATION TO TISI2 ON A SILICON SUBSTRATEJOURNAL OF APPLIED PHYSICS, 1992, 71 (02) : 720 - 724NOLAN, TPSINCLAIR, RBEYERS, R
- [2] Morphological stability of TiSi2 on polycrystalline siliconTHIN SOLID FILMS, 1997, 293 (1-2) : 34 - 39Chen, JFChen, LJ
- [3] Effect of pre-amorphization of polycrystalline silicon on agglomeration of TiSi2 in subquarter micron Si linesJOURNAL OF APPLIED PHYSICS, 1999, 86 (09) : 4943 - 4948Bae, JUSohn, DKPark, JSLee, BHHan, CHPark, JW
- [4] Agglomeration of TiSi2 thin film on (100) Si substratesJOURNAL OF APPLIED PHYSICS, 1997, 82 (06) : 2933 - 2937Rha, JJPark, JK
- [5] Investigation oF TiN/TiSi2 bilayer thin films on Si(100) substrateSILICIDE THIN FILMS - FABRICATION, PROPERTIES, AND APPLICATIONS, 1996, 402 : 107 - 112Shor, YPelleg, J
- [6] Modeling of the surface roughness of thin TiSi2 films at the point of ruptureMATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1999, 57 (03): : 186 - 196Amorsolo, AVFunkenbusch, PDKadin, AM
- [7] THERMAL-STABILITY OF TISI2 FILMS ON SINGLE-CRYSTAL AND POLYCRYSTALLINE SILICONJOURNAL OF MATERIALS RESEARCH, 1991, 6 (07) : 1502 - 1511SHENAI, K
- [8] THERMAL-STABILITY OF TISI2 ON MONOCRYSTALLINE AND POLYCRYSTALLINE SILICONJOURNAL OF APPLIED PHYSICS, 1986, 60 (01) : 243 - 246WONG, CYWANG, LKMCFARLAND, PATING, CY
- [9] THE INFLUENCE OF SILICON SUBSTRATE CRYSTALLINITY AND DOPING ON TISI2 THIN-FILM MORPHOLOGYAPPLIED SURFACE SCIENCE, 1993, 73 : 280 - 284KARLIN, TENYGREN, SMATTSSON, LANDRE, EBJUGGREN, MDHEURLE, FM
- [10] EFFECT OF A SUBSTRATE ON THE PHASE-TRANSFORMATIONS OF AMORPHOUS TISI2 THIN-FILMSJOURNAL OF APPLIED PHYSICS, 1987, 61 (02) : 540 - 544THOMPSON, RDTAKAI, HPSARAS, PATU, KN
