THE ANGULAR-DEPENDENCE OF PHYSICAL SPUTTERING OF GRAPHITE BY LIGHT-IONS IN THE LOW-ENERGY REGIME

被引：5
|
作者：
WU, CH
机构：
[1] Max-Planck-Inst fuer Plasmaphysik, Germany
来源：
JOURNAL OF NUCLEAR MATERIALS | 1988年 / 160卷 / 2-3期
关键词：
D O I：
10.1016/0022-3115(88)90035-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
8
引用
收藏
页码：103 / 106
页数：4
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