THE ANGULAR-DEPENDENCE OF PHYSICAL SPUTTERING OF GRAPHITE BY LIGHT-IONS IN THE LOW-ENERGY REGIME

被引：5

作者：

WU, CH

机构：

[1] Max-Planck-Inst fuer Plasmaphysik, Germany

来源：

JOURNAL OF NUCLEAR MATERIALS | 1988年 / 160卷 / 2-3期

关键词：

D O I：

10.1016/0022-3115(88)90035-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：103 / 106

页数：4

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