THE ANGULAR-DEPENDENCE OF PHYSICAL SPUTTERING OF GRAPHITE BY LIGHT-IONS IN THE LOW-ENERGY REGIME

被引:5
|
作者
WU, CH
机构
[1] Max-Planck-Inst fuer Plasmaphysik, Germany
关键词
D O I
10.1016/0022-3115(88)90035-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
8
引用
收藏
页码:103 / 106
页数:4
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